Naoki Watanabeabc,
Hiroaki Imotoab and
Kensuke Naka*ab
aFaculty of Molecular Chemistry and Engineering, Graduate School of Science and Technology, Kyoto Institute of Technology, Kyoto 606-8585, Japan. E-mail: kenaka@kit.ac.jp
bMaterials Innovation Lab, Kyoto Institute of Technology, Goshokaido-cho, Matsugasaki, Sakyo-ku, Kyoto 606-8585, Japan
cJNC Petrochemical Corporation, 5-1, Goikaigan, Ichihara, Chiba 290-8551, Japan
First published on 27th May 2024
Octaalkoxy-substituted polyhedral oligomeric silsesquioxane (8RO-POSS) is an attractive starting material for producing silicone resins. However, polymers derived from 8RO-POSS via the sol–gel process have seldom been reported owing to their synthetic difficulty. In this study, we attempted to use zinc acetate (Zn(OAc)2) as the catalyst for the synthesis of a series of 8RO-POSS from octahydrido-POSS (8H-POSS). The reaction conditions were optimized using heptaisobutyl monohydride-POSS (7iBu1H-POSS) as a model reaction. The desired product was obtained in 96% yield under optimized conditions. The alkoxylation of 8H-POSS was performed using methanol (MeOH), ethanol (EtOH), isopropyl alcohol (i-PrOH), and tert-butyl alcohol (t-BuOH) in the presence of Zn(OAc)2 as the catalyst. Although octamethoxy-POSS (8MeO-POSS) was isolated in the presence of a byproduct, octaethoxy-POSS (8EtO-POSS) and octaisopropoxy-POSS (8iPrO-POSS) were obtained in high yields. The degree of alkoxylation was 55% in the case of using t-BuOH. The structures of 8MeO-POSS, 8EtO-POSS, and 8iPrO-POSS were confirmed by FT-IR, 1H-, and 29Si-NMR and MALDI-TOF-MS analyses. Compared to the random silicate obtained by base-treated tetramethoxysilane (TMOS), base-treated 8EtO-POSS and 8iPrO-POSS showed that the cage structures were maintained even after the formation of condensed silicate structures via a condensation reaction.
Polyhedral oligomeric silsesquioxane (POSS) is an effective compound for synthesizing structure-controlled molecular-based hybrid materials and is a well-known framework structure used as a nano-building block. A typical POSS molecule possesses a cubic rigid structure represented by the formula R8Si8O12, where R represents organic substituents such as alkyl and aryl groups, and the various substituents are linked by Si–C bonds to each vertex of the cage structure. They are applied to nanomaterials, organic–inorganic hybrid materials, electronic materials, and biomaterials.7–23 Octaalkoxy-substituted POSS (8RO-POSS), which has reactive alkoxy silyl groups at the eight vertices, is considered an attractive starting material for the production of silicone resins because sol–gel products from 8RO-POSS have a high surface area, excellent heat resistance, and durability.24–27 These properties are expected to be applicable in various fields, such as catalysis, adsorption, and electronics. However, the sol–gel process of 8RO-POSS has seldom been reported, and the sol–gel reaction has not yet been studied in detail. This was due to the difficulty in synthesizing 8RO-POSS.
Millar et al. reported that the synthetic routes to 8RO-POSS require multiple steps or toxic reagents, and few studies have focused on their properties and reactivities. Specifically, octahydride-POSS (8H-POSS) was converted to octachloride-POSS (8Cl-POSS) using toxic chlorine (Cl2), which was further reacted with methyl nitrite (CH3ONO) to produce octamethoxy-POSS (8MeO-POSS) (Scheme 1a).28 Ruben et al. synthesized 8MeO-POSS in one step from 8H-POSS by using an alkoxy-tin compound, (CH3)3SnOCH3, which requires multiple steps for preparation (Scheme 1b).25 Noltemeyer et al. synthesized octaisopropoxy-POSS (8iPrO-POSS) from 8H-POSS using toxic and pyrophoric dicobalt octacarbony (Co2(CO)8) as a catalyst, and the substrate scope was quite limited (Scheme 1c).29 A practical synthetic method using diethyl hydroxylamine (Et2NOH) as a catalyst was proposed to prepare 8RO-POSS from 8H-POSS with alcohol (Scheme 1d).30–32 However, this reaction requires a basic catalyst, which promotes hydrolysis of Si–O bonds in the POSS framework. Therefore, this reaction requires low-polarity solvents, such as benzene, and is inapplicable to the highly reactive 8Me-POSS. Hence, it is important to develop an alternative synthesis method that suppresses the hydrolytic condensation reactions, even when using a polar solvent.
Dehydrogenative alkoxylation of Si–H groups using alcohol with transition metal catalysts, sodium hydroxide, and boron catalysts has been developed.33–41 However, these catalysts have disadvantage such as requiring multistep in preparation and being unstable in air. Shimada et al. reported that alkoxylation of trimethoxysilane in the presence of zinc acetate (Zn(OAc)2) as a catalyst with various alcohols proceeded in high yields under mild condition (1 h reaction time at room temperature) (Scheme 1e).42 Zn(OAc)2 catalyst is easily soluble in many organic solvents and can be easily handled due to its low toxicity and high stability in air. The hydrolysis and condensation of alkoxysilanes are suppressed under neutral or weakly acidic conditions by pH control. Therefore, we focused on Zn(OAc)2 because of its weak acidity and expected Zn(OAc)2 to suppress the hydrolysis and condensation of 8RO-POSS, even in polar solvents such as tetrahydrofuran (THF). In this study, Zn(OAc)2 was investigated as a catalyst for the synthesis of a series of 8RO-POSS from 8H-POSS (Scheme 1f). In addition, the sol–gel process and the products of the obtained 8RO-POSS derivatives were investigated.
Fig. 1 1H (400 MHz) NMR spectra of (a) 7iBu1MeO-POSS obtained by entry 4 in Table 1, and (b) 7iBu1H-POSS. The spectra were recorded in CDCl3. |
Entry | 7iBu1H-POSS (molar ratio) | MeOH (molar ratio) | Zn(OAc)2 (molar ratio) | 1st step | 2nd step | Yielda [%] | ||
---|---|---|---|---|---|---|---|---|
T1 [°C] | t1 [h] | T2 [°C] | t2 [h] | |||||
a NMR yield. | ||||||||
1 | 1.0 | 100 | 0.003 | 25 | 18 | — | — | 0 |
2 | 1.0 | 100 | 0.005 | 25 | 18 | — | — | 55 |
3 | 1.0 | 100 | 0.030 | 25 | 18 | — | — | 90 |
4 | 1.0 | 100 | 0.030 | 40 | 3 | 25 | 18 | 96 |
5 | 1.0 | 100 | 0.030 | 40 | 3 | — | — | 58 |
6 | 1.0 | 4 | 0.030 | 40 | 3 | 25 | 18 | 50 |
7 | 1.0 | 10 | 0.030 | 40 | 3 | 25 | 18 | 68 |
The methoxylation of 8H-POSS was performed under the optimized reaction conditions for the model reaction of entry 4 in Table 1. Unlike the case of 7iBu1H-POSS, hydrogen gas generation was lower and continue to occur even after the reaction at 40 °C for 3 h. Therefore, we increased the reaction temperature to 60 °C and found hydrogen gas generation almost stopped after the reaction at 60 °C for 3 h. After applying the reaction at 60 °C for 3 h and 25 °C for 18 h, however, the product obtained after drying the reaction mixture under reduced pressure hardly dissolved in any organic solvent. The FT-IR spectrum of the insoluble product showed no signals corresponding to the SiH (2100 cm−1) group. Based on these observations, we assumed that the hydrolysis of the resulting alkoxysilane proceeded to give silanols and that some of the silanols in the POSS compound progressed to a silicate structure (Fig. S6†). To suppress hydrolysis and condensation of the resulting product, acetic acid (0.7 mol ratio to the amount of 8H-POSS) was added to the reaction mixture after stirring at 60 °C for 3 h and 25 °C for 18 h. After drying under vacuum, the colorless solid was purified by extraction with chloroform (CHCl3) and filtration. A solid product was obtained after the solvent was removed under reduced pressure and subsequently dried under vacuum pressure at 40 °C for 18 h (Table S1†). The resulting product was soluble in n-hexane, toluene, THF, CHCl3, and acetonitrile. These results suggest that the addition of acetic acid makes the solution slightly acidic, suppressing the hydrolysis and condensation of alkoxysilanes.
The FT-IR spectrum of the obtained product exhibited peaks derived from methoxy groups at 2950, 2850, and 1460 cm−1 (Fig. S7†), and no peak was derived from the SiH group at 2100 cm−1, suggesting the quantitative methoxylation. The 1H- and 29Si-NMR spectra of the resulting product showed the peaks due to the SiOMe unit at 3.4 ppm and −101 ppm, respectively (Fig. 2 and 3), which agreed with those of the previous report.28 The signals due to the SiH group disappeared in the 1H NMR (4.2 ppm) and 29Si NMR (−85 ppm) spectra,7 suggesting that the reaction quantitatively proceeded. The 29Si NMR spectrum showed a weak signal at −92.7 ppm derived from (SiO)2Si(OR)2 (R = Me or H) unit assignable to a cage-opened byproduct.28 The integration ratio of the peak derived from (SiO)3SiOMe to the peak derived from (SiO)2Si(OR)2 was 17:1, suggesting that 8MeO-POSS was a main component. The MALDI-TOF-MS spectrum of the obtained product exhibited a molecular ion peak at 685.9, corresponding to the exact mass of 8MeO-POSS (Fig. 4(a)). 8MeO-POSS stored in air for 1 week could not solve in acetonitrile and chloroform, but octaethoxy-POSS (8EtO-POSS) and 8iPrO-POSS stored same condition could solve in chloroform.
Fig. 2 1H NMR spectra of (a) 8MeO-POSS in acetonitrile-d3 (b) 8EtO-POSS in CDCl3, (c) 8iPrO-POSS in CDCl3, and (d) 8H-POSS in C6D6. |
Fig. 3 29Si NMR spectra of (a) 8MeO-POSS in acetonitrile-d3 (b) 8EtO-POSS in CDCl3, (c) 8iPrO-POSS in CDCl3, and (d) 8H-POSS in C6D6. |
8EtO-POSS and 8iPrO-POSS were synthesized from 8H-POSS with EtOH and i-PrOH, respectively, under the optimized conditions for 8MeO-POSS. 8EtO-POSS and 8iPrO-POSS were obtained as white products in high yields (NMR yield >99%; isolated yield = 99%). 1H NMR spectrum of 8EtO-POSS showed the ethoxy unit at 1.24 and 3.89 ppm (Fig. 2(b)). The 29Si NMR spectrum exhibited the (SiO)3SiOEt group at −102.7 ppm (Fig. 3(b)). These peaks agreed well with the previous report.31 The 1H and 29Si NMR spectra of 8iPrO-POSS were also confirmed the ideal structure.31 29Si NMR spectra of 8EtO-POSS and 8iPrO-POSS exhibited no peaks at −85.0 ppm corresponding to the (SiO)3SiH group, −90 to −95 ppm from (SiO)2Si(OR)2 (R = alkyl or H), and −100 ppm from (SiO)3SiOH (Fig. 3(c)). The FT-IR spectra of 8EtO-POSS and 8iPrO-POSS showed peaks at 2900 and 1390 cm−1 derived from the ethoxy (EtO) group (Fig. S8†) and peaks at 2970 and 1370 cm−1 derived from the isopropoxy (iPrO) group (Fig. S9†); the peak derived from the SiH group at 2100 cm−1 was not detected, which supported the quantitative alkoxylation. The MALDI-TOF-MS spectra of 8EtO-POSS and 8iPrO-POSS exhibited molecular ion peaks at 799.5 and 911.7, which correspond to the exact masses of 8EtO-POSS and 8iPrO-POSS (Fig. 4(b) and (c)).
Furthermore, alkoxylation of 8H-POSS using t-BuOH was performed. Synthesis and purification were performed under the same conditions as those for 8EtO-POSS or 8iPrO-POSS. The degree of alkoxylation was 55%, as calculated from the integrated ratio of the peaks derived from the (SiO)3SiOtBu group (1.36 ppm) and the (SiO)3SiH group (4.25 ppm) in the 1H NMR spectrum (Fig. S5†). Increasing the reaction time for 1 d at 25 °C did not improve the degree of the alkoxylation. This result was attributed to the steric hindrance of t-BuOH.
The X-ray diffraction (XRD) pattern of 8MeO-POSS showed a broad peak centered at 2θ value of 25°, indicating an amorphous state (Fig. 5(a)). This was due to the contamination of the cage-opened byproducts. The XRD patterns of 8EtO-POSS and 8iPrO-POSS showed several diffraction peaks, indicating a crystalline state (Fig. 5(b) and (c)). Strong diffraction peaks at a 2θ value of approximately 8° are corresponded to the cage silsesquioxane units. Comparing the main diffraction peaks of 8EtO-POSS and 8iPrO-POSS, 8iPrO-POSS (2θ = 8.58°, d = 1.03 nm) showed wider lattice constant than that of 8EtO-POSS (2θ = 9.01°, d = 0.98 nm). A larger iPrO group volume than that of the EtO group increased the lattice constant of the crystal structure.
8MeO-POSS, 8EtO-POSS, and 8iPrO-POSS showed 5% weight losses (Td5) at 250, 210, and 240 °C, respectively, under air (Fig. 6). The decomposition temperature of 8iPrO-POSS was higher than that of 8EtO-POSS, despite its larger organic segment content. The terminal bulkiness of the iPrO group may contribute to thermal stabilization of the compound compared to linear substituents. Sharper diffraction peaks were observed for 8iPrO-POSS than 8EtO-POSS in the XRD analysis. The higher crystallinity of 8iPrO-POSS compared with that of 8EtO-POSS contributes to its thermal stability. The contribution of terminal bulkiness to the higher thermal stability was also observed in the case of the thermal stability relationship between octa(n-propyl)-POSS and octaisobutyl-POSS.16 The onset of weight loss in octa(n-propyl)-POSS is 166 °C, which is lower than that in octaisobutyl-POSS. 8MeO-POSS exhibited a higher Td5 than the others, owing to the contamination of SiOH groups in the sample.
Fig. 6 TGA thermograms of (a) 8MeO-POSS, (b) 8EtO-POSS, and (c) 8iPrO-POSS. Atmosphere: air, rate: 10 °C min−1. |
Reactivities of the alkoxy groups in 8MeO-POSS, 8EtO-POSS and 8iPrO-POSS were investigated in toluene with a trace amount of pure water, followed by adding hydrochloric acid (HCl) aqueous solution (0.1 mol L−1) and stirred for 1 h at 60 °C and for 1 h at 100 °C (Scheme 2). After the volatile materials were removed under reduced pressure, the structures of the residues were analyzed by FT-IR (Fig. 7, 8, and 9). The degree of hydrolysis of the MeO, EtO, and iPrO groups under acid treatment was estimated by decreasing the ratios of the corresponding adsorption at 2850, 2900, and 2980 cm−1, respectively, to those of the Si–O bond (Si–O–Si: 1090 cm−1) before and after the reaction. The results are summarized in Table 2. After acid treatment of 8MeO-POSS, 8EtO-POSS, and 8iPrO-POSS, the peak intensities of the alkoxy groups decreased to 8%, 64%, and 55%, respectively. 8EtO-POSS and 8iPrO-POSS showed higher stability against the acid-treated hydrolysis reaction than 8MeO-POSS, similar to the trend in the reactivity between TMOS and tetraethoxysilane (TEOS). The hydrolysis reaction of TMOS proceeded faster than TEOS in the first step hydrolysis.3 8iPrO-POSS exhibited a relatively higher hydrolysis ratio than 8EtO-POSS. This may be due to the higher steric repulsion between the iPrO groups in the POSS framework. The current study suggests that the steric hindrance between the alkoxy groups on the cage structure affects the reactivity in hydrolysis. We observed that 8MeO-POSS was decomposed to insoluble products under storage in air for 1 week, while 8EtO-POSS and 8iPrO-POSS were stable under the same condition.
Fig. 7 FT-IR spectra of (a) 8MeO-POSS, (b) acid treated 8MeO-POSS using HCl, (c) base treated 8MeO-POSS using Et3N, and (d) base treated TMOS using Et3N. |
Fig. 8 FT-IR spectra of (a) 8EtO-POSS, (b) acid treated 8EtO-POSS using HCl, (c) base treated 8EtO-POSS using Et3N, and (d) base treated TMOS using Et3N. |
Fig. 9 FT-IR spectra of (a) 8iPrO-POSS, (b) acid treated 8iPrO-POSS using HCl, (c) base treated 8iPrO-POSS using Et3N, and (d) base treated TMOS using Et3N. |
8MeO-POSS | 8EtO-POSS | 8iPrO-POSS | |||||
---|---|---|---|---|---|---|---|
Functional group [cm−1] | MeO | SiOring | EtO | SiOring | iPrO | SiOring | |
2850 | 580 | 2900 | 580 | 2980 | 590 | ||
a Height ratios of each peak of the functional groups were estimated using Si–O–Si (1090 cm−1) as a standard. The intensities of the peaks relative to those of the untreated samples are shown in parentheses. | |||||||
(a) | Un treated | 0.24 (100%) | 0.23 (100%) | 1.06 (100%) | 0.75 (100%) | 0.68 (100%) | 0.67 (100%) |
(b) | Acid treated | 0.02 (8%) | 0.11 (49%) | 0.68 (64%) | 0.78 (104%) | 0.38 (55%) | 0.52 (77%) |
(c) | Base treated | 0.02 (8%) | 0.07 (29%) | 0.02 (2%) | 0.03 (4%) | 0.03 (5%) | 0.04 (6%) |
Several groups reported that the absorption derived from the Si8O12 framework (SiOring) in octahydroxy-POSS (8HO-POSS) appeared at 577 cm−1.19,43,44 In this study, 8MeO-POSS and 8EtO-POSS exhibited absorption at 580 cm−1, while 8iPrO-POSS exhibited absorption at 590 cm−1, which is assignable to SiOring. These absorptions were expected to disappear as condensation proceeded, owing to the constraint of the molecular vibration of the monomer state Si8O12 framework by the formation of the silicate network. Therefore, the progress of the condensation reaction can be monitored by the reduction of the peaks at 580 and 590 cm−1 assignable to the ring vibration of SiOring in the POSS monomer, against the peak at 1090 cm−1 corresponding to asymmetric Si–O–Si stretching. The reduction of the peak at 580 cm−1 was 49% in the acid-treated 8MeO-POSS. By contrast, the peak intensity was negligibly reduced for 8EtO-POSS, indicating that condensation did not proceed and that the silanol groups generated by hydrolysis were maintained. The remaining 64% of the EtO groups effectively suppress condensation. The acid-treated 8iPrO-POSS proceeded with 23% condensation owing to the smaller amounts of remaining alkoxy groups in 8iPrO-POSS than in 8EtO-POSS.
The reactivities of 8MeO-POSS, 8EtO-POSS, and 8iPrO-POSS were studied using triethylamine (Et3N) instead of HCl. Hydrolysis was nearly complete for 8MeO-POSS, 8EtO-POSS, and 8iPrO-POSS under basic conditions, according to the decreased ratios of the absorption peaks corresponding to the alkoxy groups in the FT-IR spectra (Table 2(c)). The nearly complete disappearance of the 580 and 590 cm−1 peaks due to the SiOring in 8EtO-POSS and 8iPrO-POSS indicates that the condensation proceeded efficiently. By contrast, the condensation of 8MeO-POSS was less efficient, probably because 8MeO-POSS contained broken cages, which prevented condensation. When considering contraction at the eight vertices, the molecules of POSS with the reaction group should be close and dense. When all the molecules were cube-shaped, the POSS molecules were assembled closely together. However, if molecules with broken cage structures are present, this assembly collapses, and as a result, condensation does not progress efficiently.
Compared with the random silicate obtained by base-treated tetramethoxysilane (TMOS), base-treated 8EtO-POSS and base-treated 8iPrO-POSS showed negligible intensity peaks in the wavenumber range of 1200–1300 cm−1 (Fig. 7, 8, and 9). The absorption centered at 1100 cm−1 is assignable to the cage structures, as reported by Scotti et al.,45 while the broad absorption peak around 1200–1300 cm−1 is derived from random silicate, as reported by Maschmeyer et al.46 The present observations suggest that the cage structures were maintained after the formation of the silicate structures via the condensation reaction from 8EtO-POSS and 8iPrO-POSS under the base treatment. By contrast, condensation product from 8MeO-POSS exhibited a broad absorption peak between 1100–1300 cm−1, suggesting the formation of random silicate structures. The partial collapse of the cage structure of 8MeO-POSS during synthesis indicated that the steric hindrance of the MeO group was small, and the cage structure of 8MeO-POSS was easily attacked by the base. By contrast, the EtO and iPrO groups prevented the base from attacking and maintained the cage structure.
Footnote |
† Electronic supplementary information (ESI) available: Synethesis, NMR spectra, FT-IR spectra, MALDI-TOF-MS spectra, effect of acetic acid addition, solubility. See DOI: https://doi.org/10.1039/d4dt01008f |
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